Nagoya University Spinoff PeS Develops GaN-Based Electron-Beam Technology for Semiconductor Inspection & Metrology

Wednesday, Sep 3, 2025 8:47 am ET1min read

KIOXIA Iwate Corp will evaluate a gallium nitride (GaN)-based electron-beam technology developed by Photo electron Soul Inc and Nagoya University for semiconductor inspection and metrology. The technology enables non-contact electrical inspection and defect analysis in high-aspect-ratio structures, improving semiconductor manufacturing yield. KIOXIA Iwate will verify the technology's impact on defect detection, yield improvement, and root-cause analysis.

Kioxia Iwate Corporation, a leading flash memory producer, has announced it will evaluate a gallium nitride (GaN)-based electron-beam technology developed by Photo electron Soul Inc. and Nagoya University. The technology, co-developed by the startup and the university's Amano-Honda Laboratory, aims to enhance semiconductor manufacturing yield through advanced inspection and metrology processes.

The evaluation, scheduled for late September, will focus on assessing the technology's impact on defect detection, yield improvement, and root-cause analysis. The GaN-based e-Beam technology offers unique capabilities, such as non-contact electrical inspection and defect detection in high-aspect-ratio structures, which are difficult to achieve with traditional methods [2].

This partnership marks a significant breakthrough in the field of semiconductor inspection and metrology. The technology, which includes Digital Selective e-Beaming (DSeB) and Yield Controlled e-Beaming (YCeB), allows for innovative inspection and metrology through selective e-Beam radiation and real-time control of beam intensity, preventing beam misalignment [2].

Photo electron Soul Inc., founded in 2015, is the only company in the world that supplies semiconductor photocathode e-beam systems for industrial applications. The startup aims to provide products and services combining multiple technologies to drive innovations across various industries [3].

Nagoya University, a leading research institution, has been at the forefront of semiconductor technology advancements for decades. The university's partnership with Photo electron Soul Inc. reflects its commitment to fostering innovation and collaboration in the field [3].

Kioxia Iwate Corporation, with its innovative 3D flash memory technology, BiCS FLASH™, is well-positioned to benefit from this advanced inspection and metrology technology. The evaluation by Kioxia Iwate is expected to validate the technology's potential to enhance manufacturing capabilities and outperform rival NAND flash producers [2].

References:

[1] https://www.ainvest.com/news/revokes-export-waiver-tsmc-sk-hynix-samsung-restricting-china-chip-production-2509/
[2] https://www.businesswire.com/news/home/20250901390796/en/GaN-based-e-Beam-Inspection-and-Metrology-Co-developed-by-Startup-Photo-electron-Soul-Inc.-and-Nagoya-University-Will-be-Evaluated-by-Kioxia-a-Leading-Flash-Memory-Producer
[3] https://www.morningstar.com/news/business-wire/20250901390796/gan-based-e-beam-inspection-and-metrology-co-developed-by-startup-photo-electron-soul-inc-and-nagoya-university-will-be-evaluated-by-kioxia-a-leading-flash-memory-producer

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