Imec Receives World's Most Advanced High NA EUV System for Sub-2nm Chip Tech

Imec, a leading research hub in advanced semiconductor technologies, has received the ASML EXE:5200 High NA EUV lithography system, the most advanced tool available. This milestone reinforces imec's position as a launchpad for next-gen chip-scaling technologies and empowers its ecosystem partners to unlock sub-2nm logic and high-density memory technologies. The system will be integrated with a comprehensive suite of patterning and metrology tools and materials.