Kioxia will make Kitakami primary advanced fabrication hub: CEO

Kioxia Corporation has confirmed its commitment to positioning the Kitakami Plant in Iwate Prefecture, Japan, as a central hub for advanced semiconductor fabrication. The company recently announced the commencement of production for its 10th-generation 3D flash memory at Fab2 (K2), a state-of-the-art facility at the Kitakami Plant. This development follows the earlier start of operations at Fab2 in September 2025, which began with 8th-generation 3D flash memory products.

The Kitakami Plant is now producing flash memory with CBA (CMOS directly Bonded to Array) technology, which enables higher performance, greater capacity, and lower power consumption. The facility is designed with AI-driven production systems and energy-efficient manufacturing equipment, supporting Kioxia’s long-term strategy to meet growing demand for storage.

Koichiro Shibayama, President and CEO of Kioxia Iwate Corporation, emphasized that the Kitakami Plant will continue to serve as a key production base for next-generation flash memory, leveraging partnership with Sandisk. The facility is also supported by government subsidies under plan approved in February 2024, which aims to strengthen domestic semiconductor manufacturing.

With the joint venture agreement between Kioxia and Sandisk extended through December 2034, the companies are aligned to continue investing in the Kitakami Plant and advancing their 3D flash memory roadmap. This strategic focus underscores Kioxia’s broader objective to reinforce global flash memory leadership while contributing to the development of local and domestic economies.